MCL特高压纳米位移台UHV200_北京欧兰科技发展有限公司-仪器设备网

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技术参数
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MCL特高压纳米位移台UHV200技术参数

品牌	MCL Think Nano	型号	Nano-UHV200

MCL特高压纳米位移台UHV200详细介绍

Features

UHV compatible construction
Three axis (XYZ)
200 μm x 200 μm x 200 μm motion
Bakeable to 100° C
Titanium and 316SS construction
Closed loop control

Typical Applications

X-ray, VUV, and optical microscopy
Surface metrology
UHV atomic scale microscopy
Special designs - just contact us with your requirements

Product Description

The Nano-UHV200 is a three axis UHV compatible nanopositioning system constructed from titanium and 316 stainless steel. Made entirely from non-magnetic UHV compatible materials, the Nano-UHV200 is bakeable to 100°C for vacuum applications in the 10-10 Torr range. A 2 inch x 2 inch center aperture provides an optical pathway or access for sample holders. Internal position sensors utilizing proprietary PicoQ® technology provide absolute, repeatable position measurement with picometer accuracy. Cable lengths and connectors are customized for the actual installation. Connector wiring is compatible with Accu-Glass Products electrical feedthrough flanges - compatibility with other types of flanges may be requested.

Note: Customized UHV stages are always welcome - just email or call to discuss your special requirements.

Technical Specifications
Range of motion (X)	200 μm
Range of motion (Y)	200 μm
Range of motion (Z)	200 μm
Resolution (XYZ)	0.4 nm
Resonant Frequency (X)	300 Hz ±20%
Resonant Frequency (Y)	150 Hz ±20%
Resonant Frequency (Z)	175 Hz ±20%
Stiffness	2 N/μm
θ roll, θ pitch (typical)	≤1 μrad
θ yaw (typical)	≤3 μrad
Recommended max. load (horizontal)*	0.5 kg
Recommended max. load (vertical)*	0.2 kg
Body Material	Titanium and 316 SS
Controller	Nano-Drive®
* Larger load requirements should be discussed with our engineering staff.

Additional Information
Nano-UHV200 Drawing	Nano-UHV200 Catalog Pages

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